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US Patent 7326293 Patterned atomic layer epitaxy

Patent 7326293 was granted and assigned to Zyvex Labs on February, 2008 by the United States Patent and Trademark Office.

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Patent
Patent

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Current Assignee
‌
Zyvex Labs
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7326293
Date of Patent
February 5, 2008
Patent Application Number
11089814
Date Filed
March 25, 2005
Patent Citations Received
‌
US Patent 11708384 Systems and methods for mechanosynthesis
0
Patent Primary Examiner
‌
Robert Kunemund
Patent abstract

A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.

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