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US Patent 6982005 Multiple-nozzle thermal evaporation source

Patent 6982005 was granted and assigned to University of Delaware on January, 2006 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Current Assignee
University of Delaware
University of Delaware
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
69820050
Patent Inventor Names
Erten Eser0
Gregory M. Hanket0
Date of Patent
January 3, 2006
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Patent Application Number
104356370
Date Filed
May 9, 2003
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Patent Citations Received
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US Patent 11975546 Gas enclosure assembly and system
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US Patent 12064979 Low-particle gas enclosure systems and methods
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US Patent 12018857 Gas enclosure assembly and system
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Patent Primary Examiner
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Richard Bueker
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Patent abstract

A multiple nozzle thermal evaporation source includes a plurality of nozzles having a tapered shape. The nozzles may comprise a thermally conductive material having a low emissivity material.

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