Is a
Patent attributes
Patent Applicant
0
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ofer Sneh0
Date of Patent
June 28, 2005
0Patent Application Number
103475750
Date Filed
January 17, 2003
0Patent Primary Examiner
Patent abstract
An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.
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