Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Naoyuki Okamura0
Hirotaka Maruyama0
Date of Patent
March 5, 2024
0Patent Application Number
169642470
Date Filed
January 16, 2019
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A substrate processing apparatus includes: a processing chamber; a substrate holder that is disposed in the processing chamber and holds a substrate; a processing liquid supply that supplies a processing liquid to the substrate held in the substrate holder; an infrared camera that acquires an infrared image of the processing chamber; and a controller that detects at least a state of the processing liquid based on the infrared image and monitors presence/absence of an abnormality.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
