US Patent 11539897 Systems and methods for exposure control

The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.