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US Patent 10991538 High brightness x-ray reflection source

Patent 10991538 was granted and assigned to Sigray, Inc. on April, 2021 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent

Patent attributes

Patent Applicant
Sigray, Inc.
Sigray, Inc.
Current Assignee
Sigray, Inc.
Sigray, Inc.
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10991538
Patent Inventor Names
William Henry Hansen0
Janos Kirz0
Sylvia Jia Yun Lewis0
Wenbing Yun0
Date of Patent
April 27, 2021
Patent Application Number
16866953
Date Filed
May 5, 2020
Patent Citations
‌
US Patent 10074451 X-ray interferometer
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US Patent 10076297 Phase contrast X-ray tomography device
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US Patent 10085701 Medical image system and joint cartilage state score determination method
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US Patent 10105112 X-ray generating tube, X-ray generating apparatus, and radiography system
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US Patent 10115557 X-ray generation device having multiple metal target members
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US Patent 10141081 Phase contrast X-ray imaging device and phase grating therefor
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US Patent 10151713 X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof
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US Patent 10153061 Metal grating for X-rays, production method for metal grating for X-rays, metal grating unit for X-rays, and X-ray imaging device
...
Patent Citations Received
‌
US Patent 11996259 Patterned x-ray emitting target
0
Patent Primary Examiner
‌
Dani Fox
Patent abstract

An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons.

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