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US Patent 10144907 Polishing composition

Patent 10144907 was granted and assigned to Fujimi on December, 2018 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
‌
Fujimi
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Current Assignee
‌
Fujimi
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
101449070
Patent Inventor Names
Shuugo Yokota0
Yasuyuki Yamato0
Tomohiko Akatsuka0
Yukinobu Yoshizaki0
Yoshihiro Izawa0
Chiaki Saito0
Koichi Sakabe0
Shota Suzuki0
Date of Patent
December 4, 2018
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Patent Application Number
151293260
Date Filed
January 30, 2015
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Patent Primary Examiner
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Gregory E. Webb
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Patent abstract

The purpose of the present invention is to provide a means to sufficiently remove impurities remaining on the surface of a polishing object after CMP.

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