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US Patent 10074630 Semiconductor package with high routing density patch

Patent 10074630 was granted and assigned to Amkor Technology on September, 2018 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent
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Patent attributes

Patent Applicant
Amkor Technology
Amkor Technology
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Current Assignee
Amkor Technology
Amkor Technology
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
100746300
Patent Inventor Names
David Jon Hiner0
Michael Kelly0
Ronald Patrick Huemoeller0
Date of Patent
September 11, 2018
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Patent Application Number
146867250
Date Filed
April 14, 2015
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Patent Citations Received
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US Patent 12113056 Stacked dies and methods for forming bonded structures
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US Patent 11289451 Semiconductor package with high routing density patch
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US Patent 11749586 Semiconductor device including through via structure
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US Patent 11355443 Dielets on flexible and stretchable packaging for microelectronics
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US Patent 11955463 Direct bonded stack structures for increased reliability and improved yield in microelectronics
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0
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US Patent 11521934 Semiconductor package including interposer and method of manufacturing the semiconductor package
...
Patent Primary Examiner
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Khiem D Nguyen
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Patent abstract

Methods and systems for a semiconductor package with high routing density routing patch are disclosed and may include a semiconductor die bonded to a substrate and a high routing density patch bonded to the substrate and to the semiconductor die, wherein the high routing density patch comprises a denser trace line density than the substrate. The high routing density patch can be a silicon-less-integrated module (SLIM) patch, comprising a BEOL portion, and can be TSV-less. Metal contacts may be formed on a second surface of the substrate. A second semiconductor die may be bonded to the substrate and to the high routing density patch. The high routing density patch may provide electrical interconnection between the semiconductor die. The substrate may be bonded to a silicon interposer. The high routing density patch may have a thickness of 10 microns or less. The substrate may have a thickness of 10 microns or less.

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