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US Patent 9818872 Multi-gate device and method of fabrication thereof

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
June 30, 2015
Date of Patent
November 14, 2017
Patent Application Number
14788161
Patent Citations Received
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US Patent 12132082 Channel mobility improvement
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US Patent 12068318 Method of forming epitaxial features
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US Patent 12074206 Integrated circuit device with improved reliability
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US Patent 12080603 Active region cut process
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US Patent 12078551 Complementary bipolar junction transistor
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US Patent 12087842 Inner spacer features for multi-gate transistors
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US Patent 12107169 Contact structure for stacked multi-gate device
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US Patent 12119392 Semiconductor device and method
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US Patent 12125852 Multi-gate transistors with backside power rail and reduced gate-drain capacitance
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US Patent 12125915 Source/drain features of multi-gate devices
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•••
Patent Inventor Names
Wai-Yi Lien
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Chih-Hao Wang
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Ching-Wei Tsai
0
Kuo-Cheng Ching
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Ying-Keung Leung
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Carlos H. Diaz
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9818872
Patent Primary Examiner
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Robert Huber

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