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US Patent 9378992 High throughput heated ion implantation system and method

Patent 9378992 was granted and assigned to Axcelis Technologies on June, 2016 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Axcelis Technologies
Axcelis Technologies
Date Filed
June 27, 2014
Date of Patent
June 28, 2016
Patent Applicant
Axcelis Technologies
Axcelis Technologies
Patent Application Number
14317778
Patent Citations Received
‌
US Patent 11894257 Single wafer processing environments with spatial separation
0
Patent Inventor Names
Armin Huseinovic
0
Brian Terry
0
Joseph Ferrara
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9378992
Patent Primary Examiner
‌
David A. Vanore

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