US Patent 9174300 Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control
Patent 9174300 was granted and assigned to Sciaky, Inc. on November, 2015 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
May 10, 2013
Date of Patent
November 3, 2015
Patent Applicant
Patent Application Number
13891303
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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