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US Patent 9174300 Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control

Patent 9174300 was granted and assigned to Sciaky, Inc. on November, 2015 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Patent Applicant
Sciaky, Inc.
Sciaky, Inc.
Current Assignee
Sciaky, Inc.
Sciaky, Inc.
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9174300
Date of Patent
November 3, 2015
Patent Application Number
13891303
Date Filed
May 10, 2013
Patent Primary Examiner
‌
Samuel M. Heinrich
Patent abstract

A method for layer-by-layer manufacturing of a three-dimensional work piece, including: (a) delivering a metallic feed material into a feed region; (b) emitting an electron beam; (c) translating the electron beam through a first predetermined raster pattern frame that includes: (i) a plurality of points within the feed region; and (ii) a plurality of points in a substrate region that is outside of the feed region; (d) monitoring a condition of the feed region or the substrate region for the occurrence of any deviation from a predetermined condition; (e) upon detecting of any deviation, translating the electron beam through at least one second predetermined raster pattern frame that maintains the melting beam power density level substantially the same, but alters the substrate beam power density level; and (f) repeating steps (a) through (e) at one or more second locations for building up layer-by-layer.

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