US Patent 8461474 Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control
Patent 8461474 was granted and assigned to Sciaky, Inc. on June, 2013 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
February 17, 2011
Date of Patent
June 11, 2013
Patent Application Number
13029306
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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