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US Patent 6869350 Polishing pads and methods relating thereto

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
68693500
Patent Inventor Names
Lee Melbourne Cook0
David B. James0
John H. V. Roberts0
Date of Patent
March 22, 2005
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Patent Application Number
106598890
Date Filed
September 11, 2003
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Patent Citations Received
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US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ
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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods
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US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes
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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential
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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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Patent Primary Examiner
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Joseph J. Hail, III
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Patent abstract

This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention have an advantageous hydrophilic polishing material and have an innovative surface topography and texture which generally improves predictability and polishing performance.

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