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US Patent 11883925 Polishing pad and method for manufacturing same

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Yamato Takamizawa0

Hiroshi Kurihara0

Satsuki Narushima0

Ryuma Matsuoka0

Date of Patent

January 30, 2024

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Patent Application Number

170406380

Date Filed

March 19, 2019

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Patent Citations

US Patent 6860802 Polishing pads for chemical mechanical planarization

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US Patent 10195714 Polishing pad and process for producing same

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Patent Primary Examiner

Alexandra M Moore

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CPC Code

0

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Patent abstract

A polishing pad is equipped with a polishing layer having a polyurethane sheet, wherein a tan δ peak value change rate determined by formula: tan δ peak value change rate=|tan δ peak

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