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US Patent 11869812 Stacked complementary field effect transistors

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Is a
Patent
Patent
0

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
118698120
Patent Inventor Names
Alexander Reznicek0
Miaomiao Wang0
Huimei Zhou0
Ruilong Xie0
Date of Patent
January 9, 2024
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Patent Application Number
174638780
Date Filed
September 1, 2021
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Patent Citations
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US Patent 8642416 Method of forming three dimensional integrated circuit devices using layer transfer technique
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US Patent 9219005 Semiconductor system and device
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US Patent 10192819 Integrated circuit structure incorporating stacked field effect transistors
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US Patent 10192867 Complementary FETs with wrap around contacts and method of forming same
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US Patent 10256158 Insulated epitaxial structures in nanosheet complementary field effect transistors
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US Patent 10304833 Method of forming complementary nano-sheet/wire transistor devices with same depth contacts
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US Patent 10388569 Formation of stacked nanosheet semiconductor devices
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US Patent 10381438 Vertically stacked NFETS and PFETS with gate-all-around structure
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...
Patent Primary Examiner
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Thinh T Nguyen
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CPC Code
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H01L 29/66439
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H01L 29/42392
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H01L 21/84
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H01L 27/1203
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H01L 29/775
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Patent abstract

A complementary field effect transistor (CFET) structure including a first transistor disposed above a second transistor, and a first source/drain region of the first transistor disposed above a second source/drain region of the second transistor, wherein the second source/drain region comprises a recessed notch beneath the first source/drain region.

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