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US Patent 10283525 Non-volatile memory device having at least one metal and one semiconductor body extending through an electrode stack

Patent 10283525 was granted and assigned to Toshiba Memory Corporation on May, 2019 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
Toshiba Memory Corporation
Toshiba Memory Corporation
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Current Assignee
Toshiba Memory Corporation
Toshiba Memory Corporation
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
102835250
Patent Inventor Names
Masaki Tsuji0
Yoshiaki Fukuzumi0
Date of Patent
May 7, 2019
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Patent Application Number
159954070
Date Filed
June 1, 2018
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Patent Citations Received
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US Patent 12089410 Semiconductor memory device and method for manufacturing the same
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US Patent 10431595 Memory devices having vertically extending channel structures therein
Patent Primary Examiner
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Ermias T Woldegeorgis
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Patent abstract

According to an embodiment, a non-volatile memory device includes a first conductive layer, electrodes, an interconnection layer and at least one semiconductor layer. The electrodes are arranged between the first conductive layer and the interconnection layer in a first direction perpendicular to the first conductive layer. The interconnection layer includes a first interconnection and a second interconnection. The semiconductor layer extends through the electrodes in the first direction, and is electrically connected to the first conductive layer and the first interconnection. The device further includes a memory film between each of the electrodes and the semiconductor layer, and a conductive body extending in the first direction. The conductive body electrically connects the first conductive layer and the second interconnection, and includes a first portion and a second portion connected to the second interconnection. The second portion has a width wider than the first portion.

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